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Samsung SDI Visits Wonaixi for Research and Exchange, Focusing on the Application Cooperation of Cerium Products in the Semiconductor CMP Field

Recently, the technical team of Samsung SDI visited Wonaixi for a research visit. The two parties had in-depth discussions on the technical development, performance indicators, supply chain guarantee, and industrialization implementation of cerium-based products in the field of semiconductor chemical mechanical polishing (CMP). They sought opportunities for cooperation.

At the exchange meeting, Wonaixi introduced the research and development of a series of cerium-based polishing materials, the modification of powders, and their application in STI and dielectric layer polishing scenarios. Cerium-based products include various cerium-based oxides and composite cerium powders. With excellent chemical activity and polishing selectivity, they can balance polishing rate, yield, and scratch control, and are the core consumables for wafer flattening. They can be customized for particle morphology and modification schemes as needed.

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Our side focused on presenting the pilot results of high-purity, low-defect cerium-based products. The Samsung SDI team, based on their own process planning, raised requirements regarding product consistency, cost, and supply chain stability. They discussed the difficulties in adapting to the next-generation processes, verification plans, and joint development ideas.

After the meeting, the guests visited the R&D laboratory, analysis and testing area, powder post-processing and packaging sections, and directly understood the entire process of cerium powder synthesis, performance characterization, quality inspection, and dust-free packaging. They expressed their recognition of our company’s technical reserves and quality control system.

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Both parties stated that the development prospects of cerium-based CMP materials are broad. They will continue to connect, promote sample submission for testing and joint verification, explore mutually beneficial cooperation, and help the semiconductor CMP consumables industry achieve high-quality development. This exchange helped our company continuously iterate cerium-based products in line with high-end customer needs, accelerate the high-end and domestication process of rare earth CMP consumables.


Post time: Nov-07-2026